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The Directors Cut, a retrospective on 2010 and on to 2011

December 2010

2010 has been a very busy year for the Node at both the locations (ANU and UWA). All the flagship facilities have been established and operational and been heavily used by the internal as well as external users including industry and international institutions.

These facilities include Dual beam Focused Ion beam System, Nano-imprint Lithography, Electron Beam Lithography, PECVD, ICP-Etching System, RF/DC Sputter System and E-beam/Thermal Evaporator. All staff are on board including joint positions with CUDOS and AMMRF. They are looking forward to assisting you and serving your processing needs. In addition to the flagship facilities, in-kind facilities offered by ANU and UWA are widely used. The Nodes have received an EIF funding allocation which will enable us to upgrade MBE facilities at the UWA facility and install a new GaN MOCVD reactor in 2012-13 at the ANU facility. Ion implantation facilities at the ANU will be further strengthened with full wafer capability in 2011-12.

During 2010, the separate WA Node was established and it will be officially launched in March 2011. This will further strengthen the WA operations. Both WA and ACT Nodes will continue to work together with a joint website, joint newsletter and joint access committee meetings. We hope you will benefit from accessing the facilities at both the Nodes to carry out your research and development.

We want to thank all the users of the Nodes. Special thanks are due to staff of both the Nodes for their dedication and hard work in serving the Nodes and their users.

We wish you all Happy Festive and Holiday Season and we look forward to seeing you in 2011.

C. Jagadish and Laurie Faraone
Directors, ACT and WA Nodes