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Facility Equipment & Capability Update - ACT Node

December 2012

It has been a while since we have reported on new equipment purchases, facility capability updates and year-end seemed like an ideal time to re-cap and bring everyone up-to-date.

All our regular existing and NCRIS funded Flagship equipment has been operating well this year and use of the facility is increasing with both existing and new customers - in particular the FIB and E-beam Evaporator showing above forecasted usage.

We are in the process of installing and commissioning two new MOCVD reactors - one for GaN-based materials and one for GaAs and InP based structures, reducing the load of the existing MOCVD reactor. These will hopefully be up and running by the end of the first quarter of 2013. Additionally we are upgrading the High Energy Ion Implanter to implant full 6" wafers.

The Node has also extended the fabrication facility to include some new small equipment and other tools essential for a full micro and nano-fabrication facility such as:

As always, if you have any issue related to micro and/or nano-fabrication contact us as we may be able to assist you.