Available Tools marked in green

D - Deposition	L - Lithography
D3 - Sputter AJA	L2 - Mask Aligner MA6
D4 - E-beam Evaporator	L4 - Mask Aligner EVG620
D5 - Thermal Evaporator	L5 - Hot Embosser EVG520
D12 - NEW Sputter - coming 2027	L9 - Barrel Etcher
D14 - Desktop Sputter Denton	L16 - Drying Oven Heraeus
D16 - Parlylene Coater Diener	L17 - Drying Oven Heraeus
D17 - Electro Plating	L19 - N2 Desiccator Cabinet
Dxx - Desktop Carbon Coater	L20 - Direct Laser Write MLA150
	L21 - Plasma Cleaner Diener
	EBL1 - Elionix
	EBL2 - Raith
	Beamer Lithography PC
P - Etching	M - Metrology
P4 - NEW ALE - coming 2027	SEM - Scanning Electron Microscope FEI
P5 - ICP F	FIB - Focused Ion Beam FEI
P6 - ICP CL	M3 - Surface Profiler Bruker
P7 - PALD	M4 - Ellipsometer
P8 - PECVD	M12 - AFM Nanosurf
P10 - NEW ICP M - coming 2028	M13 - AFM Bruker
	PG1 Bonder (wire) Westbond
	PG3 Bonder (flip-chip) Finetech
	PG5 - Diamond Scriber
H - Ovens and Annealing	MOCVD
H4 - RTA1	MOCVD1
H5 - RTA2	MOCVD2
H6 - Vacuum Oven	MOCVD3

note: Latest update available update from the commissioning team: The major equipment tools
ICP-F, ICP-CL, PECVD and ALD are not expected to be back online before the end of July 2026.

 

 

contact:
Dr. Horst Punzmann - Node Manager
Dr. Kaushal Vora - Operations and Processes Manager

 

Welcome to ANFF ACT node

 

"Our mission is to offer a state-of-the-art facility and processing capabilities open to all scientists and researchers in Australia and overseas, to help realise outstanding research for applications in optoelectronics, photonics and quantum technologies."

 

 

Please browse our website and feel free to contact us regarding any of our services, processes and capabilities and how they may be of benefit to your reseach, project or device/material development.

 

We look forward to working with you.

 

Horst Punzmann