Publications
The ANFF access and pricing policy requires that all academic publications arising from the use of the ANFF are required to acknowledge ANFF ACT Node.
Please use the following in the acknowledgement section of any papers:
"This work used the ACT node of the NCRIS-enabled
Australian National Fabrication Facility (ANFF-ACT).
"
This is important as the publications metric is one of many key performance indicators (KPIs) that are used to report to Government and help us in gaining continuing funding to keep the facilities operational.
Please click on the below links for the year you wish to look at.
2024 | 2023 | 2022 | 2021 | 2020 | 2019 | 2018 | 2017 | 2016 | 2015 | 2014 | 2013 | 2012
News, Updates & Links
Department of Education ANFF video.
Check it out on their LinkedIn page.
Training on the new Elionix Electron Beam Lithography (EBL), has begun.
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Lots of new things happing with the new Elionix EBL.
Some of its Specifications and Capabilities include:
• Acceleration voltage 125kV
• Beam current 5pA - 100nA
• Minimum beam diameter φ1.7nm
• Minimum line width 5nm
• Scan rate : 100MHz max（10nsec）
• Exposure area X: 210mm, Y: 210mm
• Field stitching accuracy ±10nm
• Overlay accuracy ±10nm
It is capable of exposing e-beam resist with feature sizes down to 10nm. Exposure is done by scanning an electron beam over a sample defined by an input design file, thereby eliminating the use of hard masks. It features very fast loading/unloading– less than six minutes. There are five different variety of sample holders available with this tool to cover entire range of sample sizes from 1 cm x 1 cm small pieces to 7” mask holder, including multiple 2” wafers. A Spicer field cancellation system provides a highly stable electromagnetic environment for the tool. The first-order consideration of exposure time is proportional to the pattern size and the overall writing area making the tool ideal for fine features over large areas. Exposure doses differ by resist types and pattern density. There are several pieces of supporting equipment/software for Elionix users like an Olympus pre-alignment microscope adjacent to the tool. It allows us to easily measure the sample alignment mark locations relative to the stage as well as observe the sample after development. There is a design layout Beamer software package available to convert designs, perform logic operations, and proximity effect correction. Additionally, the tool software used for exposure will also provide a design conversion option for basic designs and an estimate of the required exposure time.
Events & Conferences of Interest
IEEENANO 2024
8 July, 2024
Smart Nano-2024
15 July, 2024
Grand Mercure Bali Seminyak, Bali, Indonesia
IEEE NMDC'24 - Nanotechnology Materials and Devices Conference
22 October, 2024
AIP 2024 Congress
2-6 December, 2024
Melbourne Convention and Exhibition Centre, Australia
Node Newsletters
Current and previous newsletters are available as PDF files below. If you would like to be added to our newsletter distribution list click here.
2024 June - Issue #55
2024 March - Issue #54
2023 December - Issue #53
2023 August - Issue #52
2022 December - Issue #51
2022 March - Issue #50
2021 November - Issue #49
2021 June - Issue #48
2021 March - Issue #47
2020 December - Issue #46
2020 September - Issue #45
2020 June - Issue #44
2020 March - Issue #43
2019 December - Issue #42
2019 September - Issue #41
2019 June - Issue #40
2019 March - Issue #39
2019 January - Issue #38
2018 October - Issue #37
2018 June - Issue #36
2018 March - Issue #35
2017 December - Issue #34
2017 Sept - Issue #33
2017 March - Issue #31
2016 December - Issue #30
2016 September - Issue #29
2016 June - Issue #28
2016 March - Issue #27
2015 December- Issue #26
2015 September - Issue #25
2015 June - Issue #24
2015 March - Issue #23
2014 December - Issue #22
2014 September - Issue #21
2014 June - Issue #20
2014 March - Issue #19
2013 December - Issue #18
2013 September - Issue #17
2013 June - Issue #16 - A3
2013 March - Issue #15
2012 December - Issue #14
2012 September - Issue #13
2012 June - Issue #12
2012 March - Issue #11
2011 December - Issue #10
2011 September - Issue #9
2011 June - Issue #8
2011 March - Issue #7
2010 December - Issue #6
2010 September - Issue #5
2010 June - Issue #4
2010 March - Issue #3
2009 December - Issue #2
2009 September - Issue #1
Useful Links
Merck Interactive Periodic Table
Have a look at this interactive periodic table of the elements from Merck KGaA. It offers a lot of interesting information. Click here to go to the website - available in English, French, Spanish and Dutch languages.
We also value your feedback. Please use our on-line feedback form and we use this information to improve our services to you.