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ACT Node Resources

See below for Tutorials, Standard Operating Procedures and Standard Recipes.

 

 

Tutorials

 

Below are the links to tutorials covering nanofabrication techniques supported by our node. It covers introduction, theory and capapbilities of various tools.

 

Overview of ANFF-ACT Capabilities

Physical Vapor Deposition (PVD)

Chemical Vapor Deposition (CVD)

Electron Beam Lithography (EBL)

Focussed Ion Beam (FIB)

Scanning Electron Microscopy with Cathodoluminescence (SEM-Cl)

Metal Organic Chemcial Vapor Deposition (MOCVD)

Please note that all MOCVD items are under construction.

 

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Operating Instructions

EBL Raith 150

MOCVD Ebeam Evaporator
FIB Helios NanoLab 600 P-ALD PicoSun - Sunale Thermal Evaporator Kurk Lesker Nano36
SEM-CL FEI Verios 460 SEM PECVD PlasmaLab 100 Barrel Etcher PVA TePla
ICP-Cl Samco 400iP RTA JetFirst 100 Ellipsometer JA Woollam M-2000D
ICP-F Samco 400iP Sputter AJA Hot Embosser EVG 520HE
NIL EVG 620 Mask Aligner EVG 620 RIE (old)

 

 

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Standard Recipes

 

PEVCD

SiO2

Si3N4

a-Si

MOCVD

GaAs
InP
GaN

ICP-Cl

GaAs
InP
GaN

Electron Beam (EBL)

ARP 6200

ma-N 2405

mr-POS EBR

PMMA resist
ZEP resist

 

 

ICP-F

SiO2
Si3N4
Silicon
TaOx
MoOx

Al2O3

Optical Lithography

AZ5214
ma-P 1210
ma-P 1420
DUV ma-N24O5

Sputter

Dielectrics

Metals

Ebeam Evaporator

All metals

 

P-ALD

Oxides

Nitrides

 

 

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