Australian National Fabrication Facility

 

 

 

 

 

 

 

 

 

 

 

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Laboratory and Equipment Resources

Please find relevant information below regarding Laboratory Safety, Tutorials, WHS documentation such as risk assessments and safe operating procdures WHS Procedures and Standard Process Recipes.

 

Laboratory Safety & Emergency Information

Before accessing the facilities all users must complete the induction webinar and complete the mandatory Laboratory Induction which MUST be completed and signed before access to the laboratory is granted. Please note, there will be an on-site laboratory tour to finish the induction.

It is also vital that all users familiarise themselves with the ANFF Laboratory Emergency Procedures as this document gives general information on the layout of the laboratories and associated facilities. There are also clear procedures on what to do in the event of any alarms being activated.

 

WHS Risk Assessments of Laboratories

The following table contains risk assessments (RA) and after-hours safe working procedures (AH_SWP) for our laboratories. Please familiarize youself and contact our process engineering staff if there are any questions.

Building Lab RA AH_SWP
Huxley 56 H4.30 RA AH SWP
Nuclear 58A A107/A201 RA n/a
building 160 P3.51 RA AH SWP

 

Tutorials

Below are the links to tutorials covering nanofabrication techniques supported by our node. It covers introduction, theory and capapbilities of various tools.

Overview of ANFF-ACT Capabilities Fabrication technology webinars

Overview of ANFF-ACT Capabilities

 

Physical Vapor Deposition (PVD)

Chemical Vapor Deposition (CVD)

Electron Beam Lithography (EBL)

Focussed Ion Beam (FIB)

Scanning Electron Microscopy with Cathodoluminescence (SEM-Cl)

 

Equipment Information

The following table contains equipment specific information on risks assessments (RA), safe working procedures (SWP), instruction manuals (IM) or, for reference if required, the equipment manufacturers manuals (e.g. hardware (MH), software (MS) or general equipment manual (MM). Please familiarize youself and contact our process engineering staff if there are any questions.

RA SWP IM MH MS
AFM NanoSurf Nanosurf CoreAFM M12 Lily Olivier Kaushal  
AFM Bruker Bruker Dimension Icon M13 Lily Kaushal  
Barrel Etcher PVA TePla L9 Olivier Kaushal Gayatri IM
Plasma Cleaner Diener Zepto L21 Olivier Horst Kaushal RA IM MH
Desiccator Canbinet TerraUniversal ValuLine Desiccator L19 tbd
Diamond Scriber OEG MR200 PG5 Naiyin RA IM
Electron Beam Evap. Temescal BDJ-2000 D4 Lily Kaushal
EBL Elionix Boden 125 EBL1 Gayatri Lily Kaushal RA IM
EBL Raith 150 EBL2 Gayatri Lily Kaushal IM
EDC Laurell WS1000 W6 tbd   MH
Electroplating CHI 600E xx_EP Lily Kaushal
Ellipsometer JA Woollam M-2000DI M4 Gayatri Kaushal IM
FIB FEI Helios NanoLab 600 FIB Lily Olivier Kaushal RA IM
Flipchip Bonder Finetech Fineplacer Lambda PG3 Kaushal Horst IM MM MH
Glovebox N2 Scitek Glovebox N2 SF1 Kaushal  
Hot Embosser EVG 520HE L5 Gayatri Kaushal IM MH MS
ICP-Cl Samco 400iP P6 Naiyin Kaushal IM * *
ICP-F Samco 400iP P5 Naiyin Kaushal IM * *
Mask Aligner Karl SUSS MA6 L2 Gayatri Kaushal
Mask Aligner EVG 620 L4 Gayatri Kaushal IM
Maskless Aligner Heidelberg MLA150 L20 Gayatri Kaushal RA IM
MOCVD 1 Aixtron 3x2FT III-V MOCVD1 Mykhaylo Naiyin Hoe  
MOCVD 2 Aixtron 200/4 MOCVD2 Mykhaylo Naiyin Hoe  
MOCVD 3 Aixtron 3x2FT III-N MOCVD3 Mykhaylo Naiyin Hoe  
Parylene Coater Diener model P6 D16 Olivier Naiyin Kaushal RA MH MS
PECVD Oxford Instruments PlasmaLab 100 P8 Naiyin Kaushal IM
Plasma ALD PicoSun Sunale P7 Naiyin Kaushal IM
RTA 1 Qualiflow Therm JetFirst 100 H4 Naiyin Kaushal IM
RTA 2 Jipelec JetFirst 100 H5 Naiyin Kaushal  
SEM-CL FEI Verios 460 SEM SEM Olivier Lily RA IM
Spin Coater SPS Polos SPIN150x xx_SPS Gayatri Kaushal IM  
Sputter AJA Intl. ATC-2400V D3 Olivier Kaushal IM
Sputter Denton Desk V D14 Lily IM
Sputter EMITECH K950X Dxxx Lily
Stylus Surface Profiler Bruker Dektak XT M3 Olivier Kaushal
Thermal Evaporator Kurk Lesker Nano36 D5 Lily Kaushal IM
Ultrasonic Bath Elma Trasnssonic TI-H-15 xx_ET  
Wetbench 1 MicroVoid CS-41-FRPP-9FT WB01_Spin Gayatri Olivier Kaushal   MH
Wetbench 2 MicroVoid CS-41-SS-6FT WB02_Dev Gayatri Olivier Kaushal   MH
Wetbench 3 MicroVoid CS-41-FRPP-6FT WB03_Acid tbd   MH
Wetbench 4 MicroVoid CS-41-FRPP-6FT WB04_Solvent tbd   MH
Wetbench 5 MicroVoid CS-41-SS-6FT WB05_Base tbd   MH
Wire Bonder Westbond 747677E PG1 Olivier Naiyin Kaushal  

 

* Some equipment information contains manufacturers IP and is not publically available. Please contact ANFF staff to gain access to confidential information provided by the manufacturer/vendor.

 

General Purpose Equipment Information

The following table contains general purpose equipment used in our facilities. Please beware that most of those are to be used by authorised, professional staff only.

RA SWP IM MH MS
Lift Trolley Verdex V2265 - Horst Kaushal RA IM  
 
 
 

 

Standard Process Recipes

Here is a list of typical fabricatioin process 'recipes' for a variety of tools. Please do not hesitate to consult our process engineers for advice on variations, to achieve the outcomes you require.

PEVCD

SiO2

Si3N4

a-Si

MOCVD

GaAs
InP
GaN

ICP-Cl

GaAs
InP
GaN

Electron Beam (EBL)

ARP 6200

ma-N 2405

mr-POS EBR

PMMA resist
ZEP resist

 

ICP-F

SiO2
Si3N4
Silicon
TaOx
MoOx

Al2O3

Optical Lithography

AZ5214
ma-P 1210
ma-P 1420
DUV ma-N24O5

Sputter

Dielectrics

Metals

Ebeam Evaporator

All metals

P-ALD

Oxides

Nitrides

 

EBL Booking Policy

The E-beam Lithography (EBL) systems are used quite heavy at time, making it difficult to get a time-slot less than 1-2 weeks in advance. Please follow the following guidelines when making EBL bookings for efficient use of the machines:

  1. Weekdays are separated by two 4-hour sessions per weekday, morning 09:00-13:00 and afternoon 13:00-17:00. These two time slots put a cut-off at 13:00. If you need less time, please book only that time during each time-slot. Booking longer than 4 hours should either start at 9:00 (or earlier) or 13:00 (strict). Minimum 1hr for a booking.

  2. More than one booking per user per day is NOT allowed.

  3. After 17:00 bookings are more flexible which is very feasible for longer exposure. It will be very convenient if users doing overnight bookings could start as late as possible - e.g. starting at 19:00 would give other users opportunity to extend the afternoon session for longer exposures.

  4. During weekends (Fri 18:00 - Mon 08:00) booking is fully flexible. Feel free to book any time slot of your choice.

  5. Always report a booking that cannot be used AS SOON AS POSSIBLE! Use these mail addresses to reach to ANFF staff Gayatri.Vaidya@anu.edu.au or Kaushal.Vora@anu.edu.au

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