ACT Node Resources
See below for Tutorials, Standard Operating Procedures and Standard Recipes.
Tutorials
Below are the links to tutorials covering nanofabrication techniques supported by our node. It covers introduction, theory and capapbilities of various tools.
Overview of ANFF-ACT Capabilities
Physical Vapor Deposition (PVD)
Chemical Vapor Deposition (CVD)
Electron Beam Lithography (EBL)
Scanning Electron Microscopy with Cathodoluminescence (SEM-Cl)
Metal Organic Chemcial Vapor Deposition (MOCVD)
Please note that all MOCVD items are under construction.
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Standard Operating Procedures
EBL Raith 150 |
MOCVD | Ebeam Evaporator |
| FIB Helios NanoLab 600 | P-ALD PicoSun - Sunale | Thermal Evaporator Kurk Lesker Nano36 |
| SEM-CL FEI Verios 460 SEM | PECVD PlasmaLab 100 | Barrel Etcher PVA TePla |
| ICP-Cl Samco 400iP | RTA JetFirst 100 | Ellipsometer JA Woollam M-2000D |
| ICP-F Samco 400iP | Sputter AJA | Hot Embosser EVG 520HE |
| NIL EVG 620 | Mask Aligner EVG 620 |
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Standard Recipes
PEVCD |
MOCVDGaAs |
ICP-Cl |
Electron Beam (EBL)
|
ICP-F |
Optical Lithography |
Sputter |
Ebeam Evaporator |
P-ALD |
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